Puzzle Maska – Nevena

Puzzle Mask

Innovative formula Puzzle mask, it is intended for the cosmetic treatment of problematic skin prone to acne and pimples. The formulation enriched with Kaolin, Tea Tree Oil and the 100% natural active ingredient Sopholiance S, which is also an antibacterial agent, helps prevent the appearance of new acne and pimples, while cleaning and hydrating the skin, making it soft and smooth throughout the day.

Aqua, Kaolin, Cetearyl Alcohol (and) Sodium Cetearyl Sulfate, Talc, Glyceryl Stearate Citrate, Activated Charcoal, Cetyl Alcohol, Candida bombicola/ Glucose/ Methyl Rapeseedate Ferment, Glycerin, Dicaprylyl Ether, Zinc Stearate, Aloe Barbadensis Leaf Juice, Xanthan Gum, Panthenol, Salicylic Acid, Lactic Acid, Tocopheryl Acetate, Melaleuca Alternifolia (Tea Tree) Oil, Allantoin, Bisabolol, Cetyl Palmitate, Parfum, Piroctone Olamine, Tetrasodium EDTA, Phenoxyethanol, Ethylhexylglycerin, Silica.

Apply the mask to clean facial skin, leave it on for 15–20 minutes, and then gently wash it off with warm water. It can be used 2–3 times a week.

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